Compal Electronics announced on the 7th that its proprietary quantum-inspired computing service, Compal GPU Annealer, has been awarded a grant by the National Science and Technology Council (NSTC). The technology has been officially adopted by National Cheng Kung University (NCKU) for its Digital Annealing R&D Promotion Project.
Accelerating Industry Applications with the National Quantum Team Compal is set to collaborate with Taiwan's "National Quantum Team" to accelerate the research and development of quantum-inspired computing applications. The partnership aims to facilitate large-scale commercial implementation, specifically targeting drug discovery in the biomedical sector and production optimization within the semiconductor industry.
A Breakthrough in Computing Power The Compal GPU Annealer is a cutting-edge quantum-inspired computing solution utilizing GPU acceleration. It is designed to solve complex combinatorial problems that are inefficient for traditional computing methods. The product holds broad application potential across various sectors, including financial investment, manufacturing management, and biomedical technology.
Specific Use Cases in Key Industries Collaboration between Compal and the National Quantum Team is already underway across multiple domains:
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Biomedical Sector: The Compal GPU Annealer accelerates the analysis of molecular interactions, enabling precise prediction and screening of candidate compounds. This significantly improves the success rate of compound experiments.
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Semiconductor Industry: The technology addresses critical optimization challenges, such as photomask design and process optimization, significantly enhancing overall manufacturing efficiency.
Leadership Perspective Sheng-Hua Peng, Executive Vice President of Compal Electronics, emphasized that the adoption of the Compal GPU Annealer service by the National Quantum Team marks a significant milestone. He noted that this collaboration will help drive technical innovation in Taiwan’s quantum computing sector and foster further industrial application and development.
